Practice Key Processes In Mems Fabrication (8.3) - Materials and Processes in MEMS Fabrication

Practice: Key Processes in MEMS Fabrication

Lesson 8.3Materials and Processes in MEMS Fabrication

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11 questions

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6 sample questions

Question 1.
What is the first step in photolithography?
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Think about what you need to cover the wafer first.
Question 2.
What does PVD stand for?
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Recall the 'physical' aspect of vaporizing materials.
3Question 3.
What is the first step in photolithography?
- Apply photoresist
- Develop photoresist
- Expose photoresist
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Consider what needs to be done before any exposure occurs.
4Question 4.
Dry etching is primarily used because it allows for...
- Isotropic material removal
- Higher aspect ratio with vertical sidewalls
- Slower etching rate
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Think about why we'd need precise shapes in MEMS.
Question 5.
Discuss the complete process of photolithography as applied in a MEMS fabrication scenario, including applications and materials involved.
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Think about each step's role in creating precision in MEMS.
Question 6.
Analyze how the choice between wet etching and dry etching might affect manufacturability and performance of MEMS devices.
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Consider the effects of etching types on device geometry.

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